Oxford Instruments plc (LON:OXIG – Get Free Report) insider Gavin Hill bought 7 shares of the company’s stock in a transaction that occurred on Monday, November 11th. The stock was acquired at an average price of GBX 2,122 ($27.31) per share, with a total value of £148.54 ($191.15).
Gavin Hill also recently made the following trade(s):
- On Thursday, October 10th, Gavin Hill purchased 7 shares of Oxford Instruments stock. The stock was acquired at an average cost of GBX 1,996 ($25.69) per share, for a total transaction of £139.72 ($179.80).
- On Tuesday, September 10th, Gavin Hill acquired 7 shares of Oxford Instruments stock. The shares were bought at an average cost of GBX 2,184 ($28.10) per share, with a total value of £152.88 ($196.73).
Oxford Instruments Price Performance
OXIG stock opened at GBX 2,035 ($26.19) on Wednesday. The company has a market cap of £1.18 billion, a PE ratio of 2,366.28, a price-to-earnings-growth ratio of -3.56 and a beta of 0.96. The company has a current ratio of 1.64, a quick ratio of 1.11 and a debt-to-equity ratio of 12.96. The stock has a 50-day moving average price of GBX 2,096.73 and a two-hundred day moving average price of GBX 2,308.02. Oxford Instruments plc has a 12-month low of GBX 1,858 ($23.91) and a 12-month high of GBX 2,765 ($35.58).
Oxford Instruments Cuts Dividend
Analyst Upgrades and Downgrades
Separately, Shore Capital restated a “buy” rating on shares of Oxford Instruments in a report on Wednesday, October 16th.
View Our Latest Stock Report on Oxford Instruments
About Oxford Instruments
Oxford Instruments plc provide scientific technology products and services for academic and commercial organizations worldwide. It operates through three segments: Materials & Characterisation, Research & Discovery, and Service & Healthcare. The company offers atomic force, electron, and Raman microscopy; deposition tools comprising plasma enhanced chemical vapour deposition, chemical vapour deposition, inductively coupled plasma chemical vapour deposition, atomic layer deposition, and ion beam deposition systems; and etch tools, including inductively coupled plasma etching, reactive ion etching, deep silicon etching, atomic layer etching, and ion beam etching systems.
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